Working Groups
Electron Beam Lithography
This NNCI Technical Working Group has been established to share information about the proven techniques and unique capabilities of the NNCI member sites in the area of direct write, Gaussian spot, electron beam lithography systems and processing. The purpose of these tools is to enable nanometer scale fabrication and patterning of devices and materials.
Photolithography
This NNCI Technical Working Group has been established to share information about the proven techniques and unique capabilities of the NNCI member sites in the area of photolithography. Our scope includes all mask-based, interference, and direct-write techniques and tools that use photons to form a pattern.