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This NNCI Technical Working Group has been established to share information about the proven techniques and unique capabilities of the NNCI member sites in the area of photolithography.  Our scope includes all mask-based, interference, and direct-write techniques and tools that use photons to form a pattern.

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Name Facility Email
Pat Watson Singh Center for Nanotechnology
Curt McKenna Micro Nano Technology Center (MNTC)
David Jones Singh Center for Nanotechnology
Garry Bordonaro Cornell NanoScale Science & Technology Facility (CNF)
Gyu Kim Singh Center for Nanotechnology
Jiong Hua Nebraska Center for Materials and Nanoscience (NCMN)
John Tamelier Nano3 Cleanroom Facility
Mary Tang Stanford Nanofabrication Facility
Rich Tiberio Stanford Nano Shared Facilities
Tran-Vinh Nguyen Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
Xuekun Lu Nano3 Cleanroom Facility
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