Photolithography
This NNCI Technical Working Group has been established to share information about the proven techniques and unique capabilities of the NNCI member sites in the area of photolithography. Our scope includes all mask-based, interference, and direct-write techniques and tools that use photons to form a pattern.
Photolithography News
Latest Questions on our Public Forum
Members
| Name | Facility | |
|---|---|---|
| Pat Watson | Singh Center for Nanotechnology | gewatson@seas.upenn.edu |
| Curt McKenna | Micro Nano Technology Center (MNTC) | cpmcke01@exchange.louisville.edu |
| David Jones | Singh Center for Nanotechnology | davijon@seas.upenn.edu |
| Garry Bordonaro | Cornell NanoScale Science & Technology Facility (CNF) | bordonaro@cnf.cornell.edu |
| Gyu Kim | Singh Center for Nanotechnology | kimgyu@seas.upenn.edu |
| Jiong Hua | Nebraska Center for Materials and Nanoscience (NCMN) | jhua2@unl.edu |
| John Tamelier | Nano3 Cleanroom Facility | jtamelier@ucsd.edu |
| Mary Tang | Stanford Nanofabrication Facility | mtang@stanford.edu |
| Rich Tiberio | Stanford Nano Shared Facilities | tiberio@stanford.edu |
| Tran-Vinh Nguyen | Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility | tran-vinh.nguyen@ien.gatech.edu |
| Xuekun Lu | Nano3 Cleanroom Facility | xklu@ucsd.edu |