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Electron Beam Lithography

This NNCI Technical Working Group has been established to share information about the proven techniques and unique capabilities of the NNCI member sites in the area of direct write, Gaussian spot, electron beam lithography systems and processing.  The purpose of these tools is to enable nanometer scale fabrication and patterning of devices and materials.

Electron Beam Lithography News

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Name Facility Email
Devin Brown Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
Talmage Tyler Shared Materials Instrumentation Facility (SMIF)
Steven Crawford Joint School of Nanoscience and Nanoengineering
Jiangdong Deng Center for Nanoscale Systems (CNS)
Alan Bleier Cornell NanoScale Science & Technology Facility (CNF)
Brian Wajdyk Center for Nanoscale Science and Engineering (CeNSE)
Peter Duda Pritzker Nanofabrication Facility (PNF)
Rich Tiberio Stanford Nano Shared Facilities
Maribel Montero Nano3 Cleanroom Facility
Kevin Roberts Minnesota Nano Center
N. Shane Patrick Washington Nanofabrication Facility (WNF)
Sarmita Majumder Microelectronics Research Center (MRC)
Stanley Lin Stanford Nano Shared Facilities
David Jones Singh Center for Nanotechnology
Yuan Lu Center for Nanoscale Systems (CNS)
Anna Mukhotrova Pritzker Nanofabrication Facility (PNF)
Kevin Nordquist ASU NanoFab
John Tamelier Nano3 Cleanroom Facility
Anand Sarella Nebraska Center for Materials and Nanoscience (NCMN)
Greg Allion NCSU Nanofabrication Lab (NNF)
Jun Yan Chapel Hill Analytical and Nanofabrication Laboratory (CHANL)
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