YES Vapor Prime Oven

The YES LP-III is a vacuum oven that can be used for HMDS vapor priming. Using hexamethyldisilazane (HMDS), the unit functions as a standard vacuum vapor primer. Clean wafers are dehydrated through a series of heated (150C) evacuation and dry N2 (nitrogen) refills. HMDS vapor then evaporates into the evacuated chamber forming a monolayer on the wafer surfaces. Vapor priming is used to improve the adhesion of the photoresist to the wafer.