YES Prime Oven
YES Prime Oven
Yield Engineering Systems
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Polymer
- Other
Description
The YES prime oven dehydrates the wafers at 150C and then primes the wafers using HMDS (Hexamethyldisilazane). This surface treatment improves resist coverage for standard resists.
Restrictions
No resist allowed
Maximum Substrate Size
8 inch
Comments
Oven for surface prep, polymer setting, curing, etc