YES-310TA Vapor Prime and Image Reversal Oven
YES-310TA Vapor Prime and Image Reversal Oven
Yield Engineering Systems - YES-310TA
SENIC
Joint School of Nanoscience and Nanoengineering
Joint School of Nanoscience and Nanoengineering
- Thin Film Processing
- Polymer
- Resist Processing
Description
YES-310TA is a dual function over with HMDS prime and image reversal capabilities
Maximum Substrate Size
8 inch
