XPS: PHI Versaprobe
XPS: PHI Versaprobe
Physical Electronics - Versaprobe 1
nano@stanford
Stanford University
Stanford Nano Shared Facilities
- Metrology/Characterization
- Thin Film
- XPS
Description
We have a PHI VersaProbe 1 Scanning XPS Microprobe. This system allows for high sensitivity elemental surface composition measurements and high-resolution binding energy chemical shift measurements of solid samples under high vacuum. It uses Al(K_Alpha) radiation (1486 eV) and is equipped with an argon ion sputter gun to clean the sample surface or do depth profile analysis. In addition to argon ion sputtering, the PHI VersaProbe 1 is equipped with a C60 cluster ion sputtering gun for depth profiling of polymer and organic films with minimum ion impact modification to the surface.