Xenon Difluoride Etcher
Xenon Difluoride Etcher
Xactix
SHyNE Resource
Northwestern University
Northwestern University Micro/Nano Fabrication Facility (NUFAB)
- Etching
- Dry
- Other
Description
Release of metal and dielectric structures by selective isotropic etching of silicon. Gases: XeF2 and N2
Maximum Substrate Size
4 inch