Xactix Xenon Difluoride Etcher
Xactix Xenon Difluoride Etcher
Xactix - e2
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- Other
Description
The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher. XeF2 is a vapor phase etch, which exhibits nearly very high selectivity of silicon to photo-resist, silicon dioxide, silicon nitride and aluminum.
Maximum Substrate Size
6 inch
Comments
Dry chemical etching, not plasma