Woollam RC2 Spectroscopic Ellipsometer
Woollam RC2 Spectroscopic Ellipsometer
Woollam - RC2
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Metrology/Characterization
- Thin Film
- Spectroscopy
Description
Spectroscopic ellipsometry is a noninvasive technique that measures the changes in the polarization state (Ψ and Δ) of light reflecting from a substrate. From these parameters, thickness as well as optical properties of thin films and bulk material are determined. Spectroscopic ellipsometry is used for characterization of all types of materials: dielectrics, semiconductors, metals, organics, multilayers, doped films and more. It can characterize optical constants, multilayer thicknesses, composition, crystallinity, surface and interfacial roughness, anisotropy/birefringence, constituent and void fractions, bandgap and electronic transitions of a wide variety of thin films and thin film multilayers.
Maximum Substrate Size
8 inch