Wafer Cleaner
Wafer Cleaner
Axus Technology / G&P - 412S
NNI
University of Washington
Washington Nanofabrication Facility (WNF)
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Description
Uses PVA brushes with either DI water or SC-1 solution, followed by high pressure/ultrasonic rinse to remove particulates.
Restrictions
None
Maximum Substrate Size
8 inch