WAFAB Developer Bench
WAFAB Developer Bench
WAFAB International - NA
SHyNE Resource
The University of Chicago
Pritzker Nanofabrication Facility (PNF)
- Lithography
- All Lithography
- Resist Processing
Description
The WAFAB Manual Developer Bench is a non-automated front-access wet bench designed to handle chemicals used for developing photoresist.
Maximum Substrate Size
6 inch