Vistec EBPG

High-resolution Gaussian beam system with a thermal field emission source that can be operated at 50/100kV beam energies. System can be run automatically in a course - fine mode of operation without the need for final aperture exchange which optimizes system throughput with exposure current range from 100 pA to 200 nA. Write field size up to 1mm with stitching <30nm (mean + 3σ). Sample holders: 2”, 3”, 4”, 6”, 8" wafers and pieces, 6” mask. 50 MHz pattern generator. Z Lift (Adjustable Stage Height)