Unaxis PECVD

Unaxis -

SENIC Georgia Tech Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility

Thin Film Processing
- Dielectric
  - PECVD

Description

Unaxis PECVD is a Plasma-Enhanced Chemical Vapor Deposition (PECVD) equipment for deposition of high quality semiconductor and dielectric thin films. Specification: SiO2, Si3N4, a-Si. Huge platen size holding up to 4 4" wafers. He gas available for low-stress nitride deposition. P+/N- doping gases available. High frequency RF power only.

Maximum Substrate Size

4 inch

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