Tystar Mini-Tytan 4600 Furnace System
Tystar Mini-Tytan 4600 Furnace System
TYSTAR CORPORATION - MINI TYTAN 4600
SHyNE Resource
The University of Chicago
Pritzker Nanofabrication Facility (PNF)
- Thin Film Processing
- Dielectric
- CVD
Description
The Tystar Mini-Tytan 4600 Furnace system is a Low Pressure Chemical Vapor Deposition (LPCVD) system which consists of four vacuum tubes in one furnace stack. Two of these are low pressure tubes and two atmospheric pressure tubes. The Tystar 4600 can perform low temperature oxide processes depositing materials such as silicon nitride and polysilicon. The Tystar 4600 offers high process uniformity and incorporates some of the most advanced concepts in high performance wafer processing all with a low footprint, requiring less space and electric power than furnaces of a similar capacity.
Maximum Substrate Size
6 inch