Tystar LPCVD polysilicon
Tystar LPCVD polysilicon
Tystar - Tystar 4600
NCI-SW
Arizona State University
ASU NanoFab
- Thin Film Processing
- All Thin Film Processing
- CVD
Description
LPCVD polysilicon films
Maximum Substrate Size
6 inch
Comments
Amorphous Si and polysilicon films, 550C to 650C