TylanFGA Forming Gas Anneal Furnace
TylanFGA Forming Gas Anneal Furnace
Tylan
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- All Thin Film Processing
- Annealing
Description
This is a forming gas anneal furnace (4% hydrogen in nitrogen) for annealing CMOS-compatible substrates. Wet and dry oxidation processing and N2 annealing capable.
Maximum Substrate Size
4 inch