Trion Etcher
Trion Etcher
Trion - Minilok 3
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Etching
- Dry
- ICP
Description
Trion Minilock III is a loadlocked RIE/ICP system configured primarily for etching chrome (for masks and other). It is configured with both Chlorine and Fluorine based gases
Restrictions
Cr etch only on silicon or glass
Maximum Substrate Size
8 inch