Temescal BJD 1800 Ebeam Evaporator (1)
Temescal BJD 1800 Ebeam Evaporator (1)
Ferrotec - BJD1800
SDNI
University of California, San Diego
Nano3 Cleanroom Facility
- Thin Film Processing
- All Thin Film Processing
- Evaporation
Description
The BJD1800 (1) Electron Beam Deposition System is cryo-pumped for typical base pressures in the low 10e-7 Torr range. There are four pockets in the rotating hearth of the electron gun which allows to deposit up to four materials under one pump down. Thickness and deposition rate are precisely controlled by an Inficon I/C5 Deposition Controller. Nano3 provides a wide variety of materials for e-beam deposition.
Maximum Substrate Size
6 inch