SUSS MicroTec MA-6
SUSS MicroTec MA-6
SUSS MicroTec - MA-6
MANTH
University of Pennsylvania
Singh Center for Nanotechnology
- Lithography
- All Lithography
- UV
Description
SUSS MicroTec MA-6
Designed for R&D, pilot line and production environments, the MA/BA6 Gen3 enables production-friendly research. Key components such as high resolution optics, precise alignment system and graphical user interface perfectly match with the SUSS production aligner platform.
High resolution optics allows patterning of structures below 0.5_m
Operator assisted and auto alignment permits down to 0.25_m alignment accuracy
Advanced automatic functions for maximum process control
Process compatibility with automatic equipment
Optimized split field microscope with direct viewing and/or LCD flat screen options
Allows utilization of tool sets from the previous MA/BA6 platform
Pieces through 150mm wafers.
Designed for R&D, pilot line and production environments, the MA/BA6 Gen3 enables production-friendly research. Key components such as high resolution optics, precise alignment system and graphical user interface perfectly match with the SUSS production aligner platform.
High resolution optics allows patterning of structures below 0.5_m
Operator assisted and auto alignment permits down to 0.25_m alignment accuracy
Advanced automatic functions for maximum process control
Process compatibility with automatic equipment
Optimized split field microscope with direct viewing and/or LCD flat screen options
Allows utilization of tool sets from the previous MA/BA6 platform
Pieces through 150mm wafers.
Maximum Substrate Size
6 inch