Sputter-Lesker
Sputter-Lesker
Kurt J. Lesker - Lab 18
NNI
University of Washington
Washington Nanofabrication Facility (WNF)
- Thin Film Processing
- Metal
- Sputter
Description
Single sample, 5 target sputtering system using either RF or DC magnetron sputtering
Restrictions
None
Maximum Substrate Size
6 inch