Schmid APCVD
Schmid APCVD
Schmid -
SENIC
Georgia Tech
Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
- Thin Film Processing
- Dielectric
- CVD
Description
The Schmid APCVD is an atmospheric pressure roller furnace designed to deposit phosphorous or boron doped SiO2, undoped SiO2, and Al2O3. A second chamber is available for in-situ SiO2 encapsulation immediately after the initial deposition layer.
Specifications:
- up to 550C process temperature
- up to 6"; square samples (up to 0.20";/5.0mm thick)
- typically 24-48 in/min roller speed
Specifications:
- up to 550C process temperature
- up to 6"; square samples (up to 0.20";/5.0mm thick)
- typically 24-48 in/min roller speed
Maximum Substrate Size
6 inch