Reynolds Tech Negative Photoresist Spinner Bench
Reynolds Tech Negative Photoresist Spinner Bench
Reynoldstech
MANTH
University of Pennsylvania
Singh Center for Nanotechnology
- Lithography
- All Lithography
- Resist Processing
Description
This is a laminar flow bench with two spinners with rotation speeds from 1-10,000 RPM. Wafer sizes from pieces to 150mm. Solvent drains and nitrogen guns at each spinner station. PDMS can be spun in one of the spin station; the other station is typically used for SU-8, LOR and related negative resists.
Maximum Substrate Size
6 inch