Raith E-line

The Electron Beam Lithography tool is located in room 045 of the ASTeCC building. Raith e-LiNE is an electron beam lithography tool with a 100 mm by 100 mm travel range. It uses thermal field emission filament technology and a laser-interferometer controlled stage. The column voltage varies from 100 eV to 30 keV and the laser stage moves with a precision of 2 nm. There are six apertures on the system: 7.5, 10, 20, 30, 60, and 120 mm. The electron beam current is controlled by selecting the appropriate aperture. The system is equipped with a load lock, and a fixed beam moving stage (FBMS). Typically, large area patterns are divided into small writing fields that are stitched together. The writing fields can vary from 500 nm to 2 mm. The individual fields are written one by one by scanning the beam within the field. In the FBMS mode, the beam position is fixed and the stage moves. This allows writing of long features without stitching. Design for the tool can be done on any Windows based computer. Copies of the software can be obtained from Brian Wajdyk. Once the software has been obtained for your workstation, you can check out the USB dongle based license key.