RAITH 150 TWO E-BEAM WRITER

The RAITH150TWO is the newest generation of electron beam lithography equipment and is designed to specifically address these changing requirements. It bridges the transition between pure research, device development and small batch production with Extensive Automation, maximum Repeatable Performance, the Fastest Operation and Extended Functionality. Additional improvements for ease of use, cost of ownership, lower installation requirements, environmental tolerance and smaller footprint makes the RAITH150TWO the most efficient and cost effective electron beam lithography tool.