PVD E-Beam Deposition System

EE-5 (PVD Products E-beam Deposition System) is an e-beam evaporator that can deposit up to six different materials in one pump-down, utilizing a tilting and rotating stage (up to a 6" wafer), with automated or manual control of the deposition. The system also has a separate stage (up to a 6" wafer) which can be cooled with a special chiller down to -30 °C, or heated to 300 °C. Also, up to five 4" wafers can be processed in the system at a time. Materials for EE-5 are supplied by the user to ensure purity. Training will consist of working with CNS staff in an assisted use format until the staff feels the user is adequately comfortable to safely operate the system on their own. For training or questions, contact Ed Macomber eddiemac@cns.fas.harvard.edu.