Pulsed Laser Deposition System
Pulsed Laser Deposition System
PVD products - PLD/MBE-2500
NNF
University of Nebraska-Lincoln
Nebraska Center for Materials and Nanoscience (NCMN)
- Thin Film Processing
- Dielectric
- Other
Description
Pulsed Laser Deposition (PLD) system can be used to deposite metals and oxides. The system allows for deposition in ultra-high vacuum, an inert gas environment or in a reactive gas environment, such as oxygen.