Pulsed Laser Deposition
Pulsed Laser Deposition
PVD Products Inc.
NanoEarth
Pacific Northwest National Laboratory
Environmental Molecular Sciences Laboratory (EMSL-PNNL)
- Thin Film Processing
- Dielectric
- Other
Description
EMSL's pulsed laser deposition (PLD) system is designed for epitaxial growth of oxide, ceramic, or synthetic mineral thin films and is composed of the following:
An electro-polished stainless-steel chamber pumped via a turbo molecular pump and backed by a rotary scroll dry pump
An excimer laser (KrF) for excitation at 248 nm
Three standard mass flow control units for precise and reproducible process gas flow during deposition
An electron cyclotron resonance (ECR) plasma gas source
Reflection high-energy electron diffraction (RHEED) for real-time monitoring of the surface structure and morphology
A continuous compositional spread control system for combinatorial synthesis using up to three different targets.
The PLD system is capable of growing uniform, multilayer, or compositionally spread combinatorial complex-oxide thin films with abrupt interfaces.
An electro-polished stainless-steel chamber pumped via a turbo molecular pump and backed by a rotary scroll dry pump
An excimer laser (KrF) for excitation at 248 nm
Three standard mass flow control units for precise and reproducible process gas flow during deposition
An electron cyclotron resonance (ECR) plasma gas source
Reflection high-energy electron diffraction (RHEED) for real-time monitoring of the surface structure and morphology
A continuous compositional spread control system for combinatorial synthesis using up to three different targets.
The PLD system is capable of growing uniform, multilayer, or compositionally spread combinatorial complex-oxide thin films with abrupt interfaces.