Positive/Negative Photoresist Station
Positive/Negative Photoresist Station
Reynoldstech
CNS
Harvard University
Center for Nanoscale Systems (CNS)
- Lithography
- All Lithography
- Resist Processing
Description
SB-3 is a Reynolds Tech general purpose work station for positive and negative photoresist spin coating located in the Photolithography Bay of the Center for Nanoscale Systems cleanroom. An ergonomic, anti-static, chemical spill mat is located in front of SB-3. The bench features two Headway Research spin coaters/controllers, various spinner chuck sizes for pieces through 6"/150mm wafers, two Torrey Pines hot plates, N2 drying guns and a photoresist/solvent disposal drains. The touch screen interface displays warnings, alarms and error codes. Photoresists are stocked beneath this bench for general use.
Comments
For training on this and all wet stations, sign-up at the Center for Nanoscale Systems training events web site www.cns.fas.harvard.edu/users/training_events.php