PlasmaTherm Versaline HDP VCD System
PlasmaTherm Versaline HDP VCD System
Plasma-Therm - Versaline
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Dielectric
- PECVD
Description
The PlasmaTherm Versaline HDPCVD system is a high density plasma deposition system for silicon nitride and oxide films. Deposition temperatures can be as low as 100 C.
Maximum Substrate Size
4 inch