PlasmaTherm SLR ICP Etch
PlasmaTherm SLR ICP Etch
Plasma Therm - APEX SLR (ICP)
SHyNE Resource
The University of Chicago
Pritzker Nanofabrication Facility (PNF)
- Etching
- Dry
- ICP
Description
The Plasma-Therm Apex SLR is a High Density Plasma Chemical Vapor Deposition (HDPCVD) system. It uses an Inductively Coupled Plasma (ICP) source to generate higher density plasma than a PECVD system providing deposition at lower temperatures for higher quality, low temperature films.
Maximum Substrate Size
6 inch