Plasma Therm Versaline LL ICP Dielectric Etcher
Plasma Therm Versaline LL ICP Dielectric Etcher
Plasma-Therm - Versaline
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- ICP
Description
Default config: 4"; Versaline LL-ICP Oxide Etcher offers precision silicon oxide and deep glass/quartz etching.
Maximum Substrate Size
6 inch