Plasma-Therm Apex SLR HDPCVD
Plasma-Therm Apex SLR HDPCVD
PLASMA-THERM LLC - APEX SLR (HDPCVD)
SHyNE Resource
The University of Chicago
Pritzker Nanofabrication Facility (PNF)
- Thin Film Processing
- Dielectric
- CVD
Description
The Plasma-Therm Apex SLR is a High Density Plasma Chemical Vapor Deposition (HDPCVD) system. It uses an Inductively Coupled Plasma (ICP) source to generate higher density plasma than aPECVD systemproviding deposition at lower temperatures for higher quality, low temperature films.
Maximum Substrate Size
6 inch