Plasma Etch
Plasma Etch
Plasma Etch - PE-50
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Cleaning
- All Cleaning
- Plasma/Stripper
Description
The Plasma Etch PE-50 is a used for plasma cleaning and surface treatment, including for PDMS bonding. The substrate platform is 4.5" wide and 6" deep with 2.5" clearance. Oxygen and air are available.
Maximum Substrate Size
4 inch