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Oxford Plasmalab 100 ICP Reactive Ion Etcher

Oxford Plasmalab 100 ICP Reactive Ion Etcher

Oxford Instruments - 100 ICP

RTNN North Carolina State University NCSU Nanofabrication Lab (NNF)
  • Etching
    • Dry
      • RIE
Description
This ICP etcher is used for GaN, AlGaN, and GaS etching. Gases available in this tool are O2, N2, Ar, Cl, BCl3, CHF3, and SF6.  The system is capable of processing samples up to 6" in diameter.
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