Oxford Plasmalab 100 ICP Reactive Ion Etcher
Oxford Plasmalab 100 ICP Reactive Ion Etcher
Oxford Instruments - 100 ICP
RTNN
North Carolina State University
NCSU Nanofabrication Lab (NNF)
- Etching
- Dry
- RIE
Description
This ICP etcher is used for GaN, AlGaN, and GaS etching. Gases available in this tool are O2, N2, Ar, Cl, BCl3, CHF3, and SF6. The system is capable of processing samples up to 6" in diameter.