Oxford III-V etcher
Oxford III-V etcher
Oxford Instruments - Plasma Pro 100 Cobra
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- ICP
Description
Default config: 4"; OxforPlasmaPro 100 Cobra III-V Etcher offers precision etching of III-V compounds. It is currently supports etching of GaAs, InGaAs, InAs, InP, InGaAsP, and GaP. Other substrates require engineering review and approval.
Maximum Substrate Size
8 inch