Novellus Concept II PECVD
Novellus Concept II PECVD
Lam Research - Concept II
SENIC
Joint School of Nanoscience and Nanoengineering
Joint School of Nanoscience and Nanoengineering
- Thin Film Processing
- Dielectric
- PECVD
Description
This tool can deposit stress-controlled silicon dioxide and nitride on wafer stack
Maximum Substrate Size
8 inch