Nanostrip Tank
Nanostrip Tank
Reynolds Tech - custom
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Cleaning
- All Cleaning
- Wet Bench
Description
A wet deck with various acid etching tanks and two spray dump rinsers is available for processing wafers. All tanks are recirculated with filtration to provide clean wafer processing. On bath is configured for Nanostrip, a more stable version of the commonly known pirhana etch (Sulfuric Acid / Hydrogen Peroxide) used to remove residual organics.
Maximum Substrate Size
6 inch