Nanospec Film Thickness Measurement System
Nanospec Film Thickness Measurement System
Nanometrics - AFT 350
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Metrology/Characterization
- Thin Film
- Thickness
Description
The Nanometrics Nanospec 010-180 system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range. Features: Preprogrammed for standard films. Small sample spot size (down to tens of microns at 40X objective). The Nanometrics Nanospec 210XP system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range.
Maximum Substrate Size
6 inch