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Nanospec Film Thickness Measurement System

Nanospec Film Thickness Measurement System

Nanometrics - AFT 350

nano@stanford Stanford University Stanford Nanofabrication Facility
  • Metrology/Characterization
    • Thin Film
      • Thickness
Description
The Nanometrics Nanospec 010-180 system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range. Features: Preprogrammed for standard films. Small sample spot size (down to tens of microns at 40X objective). The Nanometrics Nanospec 210XP system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range.
Maximum Substrate Size
6 inch
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