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NanoScribe GT2

NanoScribe GT2

Nanoscribe - GT2

CNF Cornell University Cornell NanoScale Science & Technology Facility (CNF)
  • Patterning
    • All Patterning
      • 3D Printing
Description
The NanoScribe GT2 Laser Lithography System is a state of the art two-photon polymerization volumetric maskless printer. It can create three-dimensional nanostructures using a NIR femtosecond laser via direct-write onto a photosensitive resin that is subjected to a non-linear two-photon absorption process. This process involves cross-linking the resin via UV absorption. In essence, the laser sets a focal light cone where a concentration of the light intensity defines the exposure focal spot volume or a “3D Pixel”. Using this technique a CAD design can be broken into and X, Y, Z coordinate system to define the structure pixel by pixel and layer by layer.
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