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Nanoscribe 3D Lithography System

Nanoscribe 3D Lithography System

Nanoscribe - Photonic Professional GT

SENIC Georgia Tech Institute for Electronics and Nanotechnology Micro/Nano Fabrication Facility
  • Patterning
    • All Patterning
      • 3D Printing
Description
The next generation 3D laser lithography system, Photonic Professional GT sets new standards in 3D micro printing and maskless lithography. It combines two writing modes in one device: an ultra-precise piezo mode for arbitrary 3D trajectories (FBMS) and the high-speed galvo mode (MBFS) for fastest structuring in a layer-by-layer fashion. In combination with the software package, the system is embedded best along the 3D printing workflow and offers a high degree of automation for direct manufacturing. In addition, the Photonic Professional GT allows for the fabrication of high-resolution photo masks and other direct write applications.
Maximum Substrate Size
4 inch
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