Nabity
Nabity
Nabity
CNF
Cornell University
Cornell NanoScale Science & Technology Facility (CNF)
- Lithography
- All Lithography
- EBL
Description
The Nabity system turns an sem into a simple ebeam system. The hardware takes control of the deflection system on the sem and can then be used to expose patterns in resist. This is particular useful when there is a need for low energy exposures. The tool is very manual, as opposed to the fully automated JEOL systems, and the calibrations are very primitive. 1keV to 30keV
Maximum Substrate Size
1 inch