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milling: Intlvac Ion Mill

milling: Intlvac Ion Mill

Intlvac - Nanoquest I-LL

nano@stanford Stanford University Stanford Nano Shared Facilities
  • Etching
    • Dry
      • Ion Mill
Description
The Intlvac Nanoquest Research Ion Beam Milling System is a Versatile R&D platform. The ion beam processing is a controllable thin film etching technique with independent control of ion energy, ion current density, and incidence angle. Designed as a general purpose R&D tool, the Nanoquest I is capable of performing processes ranging from a simple etch to multi-angle, utilizing substrate rotation and substrate offset to achieve a superior etch. The Nanoquest System combines a 4 inch water-cooled, rotating stage, a Kaufman ion source, an easily accessible stainless steel vacuum chamber with Turbo Molecular pumping.
Maximum Substrate Size
4 inch
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