milling: Intlvac Ion Mill
milling: Intlvac Ion Mill
Intlvac - Nanoquest I-LL
nano@stanford
Stanford University
Stanford Nano Shared Facilities
- Etching
- Dry
- Ion Mill
Description
The Intlvac Nanoquest Research Ion Beam Milling System is a Versatile R&D platform. The ion beam processing is a controllable thin film etching technique with independent control of ion energy, ion current density, and incidence angle. Designed as a general purpose R&D tool, the Nanoquest I is capable of performing processes ranging from a simple etch to multi-angle, utilizing substrate rotation and substrate offset to achieve a superior etch. The Nanoquest System combines a 4 inch water-cooled, rotating stage, a Kaufman ion source, an easily accessible stainless steel vacuum chamber with Turbo Molecular pumping.
Maximum Substrate Size
4 inch