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Metallica Sputter System

Metallica Sputter System

NA

nano@stanford Stanford University Stanford Nanofabrication Facility
  • Thin Film Processing
    • Metal
      • Sputter
Description
Metalica is a metal sputter that was built in-house to provide flexible processing options for non-CMOS compatible materials. Two magnetron S-guns provide the high energy source for sputtering of the metal target. Metalica provides non-directional thin film (< 1 um) deposition of Ti, Cu, Au, Al, Ag, Cr, Mo, Pd, Pt, W and NiCr.
Maximum Substrate Size
4 inch
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