Metallica Sputter System
Metallica Sputter System
NA
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Thin Film Processing
- Metal
- Sputter
Description
Metalica is a metal sputter that was built in-house to provide flexible processing options for non-CMOS compatible materials. Two magnetron S-guns provide the high energy source for sputtering of the metal target. Metalica provides non-directional thin film (< 1 um) deposition of Ti, Cu, Au, Al, Ag, Cr, Mo, Pd, Pt, W and NiCr.
Maximum Substrate Size
4 inch