Memsstar Orbis Alpha Oxide Etch System
Memsstar Orbis Alpha Oxide Etch System
Memsstar Limited - ORBIS ALPHA
SHyNE Resource
The University of Chicago
Pritzker Nanofabrication Facility (PNF)
- Etching
- Dry
- Deep Oxide
Description
The Memsstar Orbis Alpha Oxide Etch System is a small footprint, self-contained oxide etch system which utilizes hydrogen fluoride etchants along with memsstars unique patented high volume production process to enable researchers to develop production-capable processes for the next generation of MEMS devices.
Maximum Substrate Size
6 inch