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Memsstar Orbis Alpha Oxide Etch System

Memsstar Orbis Alpha Oxide Etch System

Memsstar Limited - ORBIS ALPHA

SHyNE Resource The University of Chicago Pritzker Nanofabrication Facility (PNF)
  • Etching
    • Dry
      • Deep Oxide
Description
The Memsstar Orbis Alpha Oxide Etch System is a small footprint, self-contained oxide etch system which utilizes hydrogen fluoride etchants along with memsstars unique patented high volume production process to enable researchers to develop production-capable processes for the next generation of MEMS devices.
Maximum Substrate Size
6 inch
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