Matrix Plasma Resist Strip
Matrix Plasma Resist Strip
Matrix - Matrix 105
nano@stanford
Stanford University
Stanford Nanofabrication Facility
- Etching
- Dry
- RIE
Description
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
Maximum Substrate Size
4 inch