Mask Aligner
Mask Aligner
Suss - MABA 6
SHyNE Resource
Northwestern University
Northwestern University Micro/Nano Fabrication Facility (NUFAB)
- Lithography
- All Lithography
- UV
Description
The M/BA6 is used for MEMS applications, production of optical components and compound semiconductors. It is very convincing through its multifaceted field of applications in research and development environments, and excels equally in production environment thanks to its good process results.
Maximum Substrate Size
6 inch