Lithography Solvent Bench

This wet bench is used for processes requiring manual handling of flammable chemicals, such as solvents or other volatile organics, including photoresist. Processes performed here include mask and substrate cleaning and pouring resist into smaller containers for manual dispensing. No oxidizers (generally corrosives) are allowed. Liquid waste is collected locally. A solid hazardous waste under the benchtop is used to collect cleanroom wipes, vinyl gloves, swabs, and other solid materials which may become chemically contaminated.