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Lesker2 Sputter

Lesker2 Sputter

Kurt J. Lesker - PVD 200

nano@stanford Stanford University Stanford Nanofabrication Facility
  • Thin Film Processing
    • Metal
      • Sputter
Description
Lesker2 is a load locked single wafer metal sputter providing flexible processing options for non-CMOS compatible materials. The eight gun magnetron Lesker is classified as gold contaminated and provides non-directional thin film (< 1 um).
Maximum Substrate Size
6 inch
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