Layout BEAMER/LAB software
Layout BEAMER/LAB software
GenIsys - BEAMER/LAB
CNS
Harvard University
Center for Nanoscale Systems (CNS)
- Lithography
- All Lithography
- Other
Description
Layout BEAMER /LAB software is designed for high performance patterning generation of e-beam lithography and photolithography. It ensures high performance EBL and photo pattering, through proximity correction, layout processing and fracturing, and other technologies.